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    • 专利摘要:
    The invention relates to a device for detecting (1) electromagnetic radiation, comprising: - a substrate, - at least one thermal detector (2), arranged on the substrate, comprising an absorbent membrane suspended above the substrate, - a encapsulation structure (5) of the thermal detector, comprising an encapsulation layer (6) extending around and above said thermal detector so as to define with the substrate a cavity (4) in which said thermal detector is located , characterized in that the encapsulation layer comprises at least one through orifice (8), said release vent, each release vent being arranged such that at least one thermal detector has a single release vent located opposite the corresponding absorbent membrane, preferably to the right of the center of said absorbent membrane.
    公开号:FR3033045A1
    申请号:FR1551489
    申请日:2015-02-20
    公开日:2016-08-26
    发明作者:Geoffroy Dumont；Laurent Carle；Pierre Imperinetti；Stephane Pocas；Jean-Jacques Yon
    申请人:Commissariat a lEnergie Atomique CEA；Commissariat a lEnergie Atomique et aux Energies Alternatives CEA；
    IPC主号:
    专利说明:

    [0001] The field of the invention is that of devices for detecting electromagnetic radiation, in particular infrared or terahertz radiation, comprising at least one thermal detector and a structure that can be used to detect electromagnetic radiation. encapsulation which forms a hermetic cavity in which is housed the thermal detector, the encapsulation structure comprising at least one release vent. The invention applies in particular to the field of imaging and thermal thermography. STATE OF THE PRIOR ART A device for detecting electromagnetic radiation, for example infrared or terahertz, comprises at least one thermal detector and usually a matrix of thermal detectors, said elementary, where each detector each comprises a portion able to absorb the radiation to be detected. . In order to insure the thermal insulation of the thermal detectors, each portion is usually in the form of a membrane suspended above the substrate and thermally insulated from the latter by holding and thermal insulation elements. These holding elements also provide an electrical function by electrically connecting the thermal detectors to a reading circuit generally disposed in the substrate.
    [0002] To ensure optimal detector operation, a low level of pressure is required. For this purpose, the detectors are generally confined or encapsulated, alone or in groups, in hermetic cavities under vacuum or under reduced pressure. FIG. 1 illustrates an example of detection device 1 adapted to detect infrared radiation, more precisely a pixel of the detection device formed here of a bolometric detector 2 resting on a substrate 3 and disposed alone in a hermetic cavity 4, as described in the publication by Dumont et al., Current Progress on Pixel Level Packaging for Uncooled IRFPA, Proc. SPIE 8353, Infrared Technology and Applications XXXVIII, 8353112012.
    [0003] In this example, the detection device 1 comprises an encapsulation structure 5, also called capsule, which defines the cavity 4 in which the bolometric detector 2 is located. The encapsulation structure 5 comprises a thin encapsulation layer 6. which defines with the substrate 3 the cavity 4, and a thin sealing layer 7 which covers the encapsulation layer 6 and ensures the hermeticity of the cavity 4. The encapsulation 6 and sealing layers 7 are transparent to the radiation electromagnetic to detect. The detection device 1 is produced by thin film deposition techniques and in particular sacrificial layers. During the production process, the sacrificial layers are removed and discharged from the cavity through one or more release vents 8 provided in the encapsulation layer 6. The sealing layer 7 ensures, after removal of the layers sacrificial and evacuation of the cavity 4, the clogging of the release vents 8. However, the detection device can see its optical and / or electrical properties, including those of the absorbent membrane, modified or degraded as a result of certain steps of the method of realization which follow that of the realization of the membrane. DISCLOSURE OF THE INVENTION The object of the invention is to remedy at least in part the disadvantages of the prior art, in particular to propose a device for detecting electromagnetic radiation, including its optical and / or electrical properties, in particular the 3033045 3 properties. of the absorbent membrane, are preserved during the steps subsequent to the step of producing the membrane. Another object of the invention is to provide a detection device whose risks of mechanical deterioration of the detector and / or the encapsulation structure are minimized. To this end, the invention proposes a device for detecting electromagnetic radiation, comprising a substrate, at least one thermal detector disposed on the substrate, comprising a membrane adapted to absorb the radiation to be detected, suspended above the substrate and thermally insulated from the latter by means of holding and thermal insulation elements, an encapsulation structure of said at least one thermal detector, comprising an encapsulation layer extending around and above said at least one thermal detector so as to define with the substrate a cavity in which said at least one thermal detector is located. According to the invention, the encapsulation layer comprises at least one through orifice, said release vent, each release vent being arranged such that at least one thermal detector has a single release vent located opposite the absorbing membrane. corresponding, preferably to the right of the center of said absorbent membrane. According to one embodiment, a plurality of thermal detectors are disposed in said cavity, the encapsulation layer comprising a plurality of release vents arranged such that at least a portion of said thermal detectors each have a single release vent. located opposite the corresponding absorbent membrane. Alternatively, a single thermal detector is disposed in said cavity, the encapsulation layer then comprising a single release vent located opposite the absorbing membrane of the thermal detector.
    [0004] Each absorbent membrane may comprise a through orifice, located in line with the corresponding release vent, of dimensions equal to or greater than those of said vent. The absorbent membrane may comprise a stack of a bolometric layer, a dielectric layer structured so as to form two distinct portions, and an electrically conductive layer structured so as to form three electrodes, including two electrodes intended to be worn. at the same electrical potential frame the third so-called central electrode intended to be brought to a different electrical potential, each electrode being in contact with the bolometric layer, the central electrode being electrically isolated from the other electrodes by the dielectric layer, the orifice passing through the central electrode and the bolometric layer in an area in the portions of the dielectric layer. The encapsulation structure may further comprise a sealing layer covering the encapsulation layer so as to make the cavity hermetic, the substrate comprising a bonding layer disposed opposite the through orifice of the corresponding membrane, and adapted to ensure the adhesion of the material of the sealing layer. The bonding layer may extend under the whole of the corresponding membrane and be made of a material adapted to further ensure the reflection of the electromagnetic radiation to be detected. The release vent may have a transverse profile, in a plane orthogonal to the plane of the substrate, whose width increases as the distance to the substrate increases. The encapsulation structure may further comprise a sealing layer covering the encapsulation layer so as to make the cavity hermetic, the sealing layer having a border which extends in the direction of the thickness of the coating layer. sealing, from the edge of the release vent, with a non-zero angle α relative to an axis orthogonal to the plane of the substrate, the transverse profile of the release vent (8) forming an angle p by ratio to the same orthogonal axis greater than the angle a. The longitudinal end of the release vent may have a circular arc shape, or be formed of a succession of substantially rectilinear segments inclined relative to one another. The detection device may comprise a matrix of thermal detectors, in which the encapsulation layer comprises at least one portion, called the internal support portion, located between two adjacent detectors, which bears directly on the substrate.
    [0005] The inner bearing portion may have a profile, in a plane parallel to the plane of the substrate, of oblong shape, preferably at the rounded longitudinal ends. The inner bearing portion may comprise a side wall and a lower part, said lateral wall extending in a plane substantially orthogonal to the plane of the substrate over the entire height of the cavity, and the lower part being in contact with the substrate.
    [0006] At least one inner bearing portion may be disposed between two adjacent absorbent membranes and two adjacent holding nails, each of said holding nails participating in maintaining said adjacent membranes, and wherein the inner bearing portion is longitudinally oriented along said membranes. The encapsulation layer may comprise a peripheral wall which surrounds the detector array 20, and which has a section, in a plane parallel to the substrate plane, of square or rectangular shape, the corners of which are rounded. The holding and thermal insulating elements may comprise holding nails, the attachment layer further comprising portions on which the holding nails rest, and / or portions on which support portions 25 of internal support rest. the encapsulation layer, being made of a material capable of ensuring the adhesion of the holding nails and / or support portions.
    [0007] BRIEF DESCRIPTION OF THE DRAWINGS Other aspects, objects, advantages and features of the invention will become more apparent upon reading the following detailed description of preferred embodiments thereof, given by way of non-limiting example, and with reference to the accompanying drawings in which, in addition to FIG. 1 previously discussed: FIG. 2 is a diagrammatic sectional view of a detection device according to one embodiment, in which a single detector release vent is disposed in look at the suspended membrane of the detector; FIGS. 3 and 4 are schematic views of a detection device according to another embodiment, seen from above (FIG. 3) and in section (FIG. 4), in which the suspended membrane comprises an intermediate dielectric layer; Figure 5 is a schematic top view of a release vent according to one embodiment, wherein the vent has an oblong shape profile with rounded ends; Figure 6 is a schematic sectional view of a detection device according to another embodiment, wherein the transverse profile of the vent is flared towards the sealing layer; Figures 7 to 9 are schematic views of a detection device according to another embodiment, wherein the encapsulation structure has internal support portions; Figures 10 to 12 are sectional views of a detection device shown in Figure 7, at different stages of the production method; Figures 13 and 14 are partial and schematic representations, in top view, of the peripheral wall of the encapsulation layer according to one embodiment, wherein the wall has a rounded portion.
    [0008] DETAILED DESCRIPTION OF PARTICULAR EMBODIMENTS In the figures and in the remainder of the description, the same references represent identical or similar elements. Figure 2 illustrates an example of an electromagnetic radiation detecting device according to one embodiment. In this example, the electromagnetic radiation detection device 1 is adapted to detect infrared or terahertz radiation. It comprises a matrix of thermal detectors 2, said elementary. Figure 1 is a partial view of the detection device and shows only a single detector disposed in a cavity.
    [0009] It comprises a substrate 3, for example silicon, comprising a read circuit (not shown) for example made in CMOS technology, for applying the polarizations necessary for the operation of the detectors and to read the information from them. The thermal detector 2 comprises a portion adapted to absorb the radiation to be detected. This absorbent portion is generally thermally insulated from the substrate and may be disposed at a so-called absorbent membrane 9 suspended above the substrate 3 by holding and heat insulating elements 11 such as anchoring nails 11a. associated with thermal insulation arms 11b. The membranes 9 are spaced apart from the substrate 3 by a distance typically between 1 μm and 5 μm, preferably 2 μm when the detectors are designed for the detection of infrared radiation with a wavelength of between 8 μm and 14 μm. In the following description, the thermal detector 2 is a bolometer whose absorbent membrane 9 comprises a thermistor material whose electrical conductivity varies as a function of the heating of the membrane. However, this example is given for illustrative purposes and is in no way limiting. Any other type of thermal detector may be used, for example pyroelectric, ferroelectric or even thermopile detectors.
    [0010] In this example, a pixel of the detection device comprises a detector 2 as well as its own anchoring nails 11a and heat-insulating arms (not shown). Other configurations are possible, especially when a matrix of detectors is arranged in the same cavity. In this case, the detectors can be brought closer to one another, in particular by connecting the thermal insulation arms of different neighboring thermal detectors to one and the same anchoring nail, the reading architecture of the thermal detectors then being adapted, as describe the documents EP1106980 and EP1359400. This results in an improvement of the sensitivity of the detectors by the elongation of the isolation arms and an increase in the filling rate by the reduction of the area of each pixel not dedicated to the absorption of the electromagnetic radiation. The detection device is thus particularly suitable for small matriculation steps, for example between 25um and 17um, or even 12u.m. The detection device 1 comprises an encapsulation structure 5, or capsule, which defines, with the substrate 3, a hermetic cavity 4 inside which the thermal detector 2 is located here. The encapsulation structure 5 is formed of a thin encapsulation layer 6 deposited so that it comprises a peripheral wall 6a which surrounds the detector 2 and an upper wall 6b which extends above the detector 2. The upper wall 6b is substantially flat and extends over the suspended membrane 9 at a distance for example between 0.5um and 5um, preferably 1.5u.m. The encapsulation layer comprises at least one through orifice, called release vent, intended to allow the evacuation of the sacrificial layers during the device manufacturing process. The vent forms a local opening in the encapsulation layer 6 opening into the cavity 4. The encapsulation structure further comprises a sealing layer which covers the encapsulation layer and closes the release vent. This sealing layer usually has an additional antireflection function. The encapsulation layer 6 comprises at least one release vent 8 arranged so that at least one thermal detector 2 present in the cavity 4 has a single release vent 8 located opposite its absorbent membrane 9, preferably The inventors have found that this positioning of a single vent opposite the absorbent membrane of the thermal detector makes it possible to overcome, after elimination of the sacrificial layers, the presence of residues of sacrificial layers attached to the membrane. The presence of these residues has in particular been observed when at least two vents per detector are arranged on either side of the membrane. The residues are generally located in an equidistant zone of the different vents, in which is the suspended membrane. They can modify the optical and / or electrical and / or thermal properties of the membrane (for example by increasing the mass of the membrane which induces a decrease in the response time of the detector), or even modify the residual pressure level under the effect of a gradual degassing. In addition, the realization of the vent is simplified by its remoteness from the high topography areas that are the trenches (described below), which provides a good dimensional control of the shape of the vent. In the case where the cavity 4 houses a single thermal detector 2, the encapsulation layer 6 then comprises a single release vent 8 located opposite the absorbent membrane 9 of the thermal detector. In general, the detector device comprises an array of thermal detectors 2 where each detector is encapsulated in a single cavity. The encapsulation structure then comprises a matrix of cavities all formed by the same encapsulation layer. At each cavity, the encapsulation layer comprises a single release vent disposed opposite the absorbent membrane of the detector housed in the cavity. In the case where the cavity 4 houses a plurality of thermal detectors 2, the encapsulation layer 25 then comprises at least one release vent, and preferably a plurality of release vents arranged so that at least a portion of said thermal detectors 2 each have a single release vent 8 located opposite the corresponding absorbent membrane 9. Each thermal detector of the matrix may have a single vent arranged opposite the corresponding absorbent membrane.
    [0011] Alternatively, only a portion of the thermal detectors may each have a single release vent located opposite the corresponding membrane. It is then advantageous that, for a line or a column of thermal detectors, the release vents are arranged all the N odd detectors. This prevents sacrificial layer residues from being present at the absorbent membrane of a non-venting detector. By way of example, in the case where N = 3, two adjacent detectors not provided with a release vent are arranged between two detectors each provided with a single release vent. In this example, none of the thermal detectors, whether or not provided with a release vent, will see its absorbent membrane degraded by the presence of sacrificial layer residues. This variant embodiment is particularly advantageous in the case of small stamping steps, for example when the detector layout pitch is of the order of 12 μm or less. It is advantageous to provide a through hole 19 at the membrane 9 of the detector, located at the right of the corresponding vent 8, and whose dimensions are equal to or greater than those of the vent 8, with a margin of safety to take account of any misalignment of the vent and / or the orifice of the membrane which may be of the order of 200 nm to 500 nm. Thus, during the deposition of the sealing layer, a portion of the sealant material likely to fall through the vent will not settle on the membrane but will pass through the orifice of the membrane and settle on the substrate. It is then advantageous to provide a tie layer, under the membrane 9, at the through orifice 19, to ensure the attachment of the sealing agglomerate which would have fallen. Thus, during the step of sealing the cavity, in the case where a quantity of material of the sealing layer would pass through the vent, it would settle and adhere to the bonding layer. This allows in particular to overcome the type of material present on the surface of the substrate, and more specifically the material used to passivate the upper face of the substrate. This attachment layer 14 may extend, continuously or discontinuously, at different regions of the cavity, more precisely under the membrane 9 and opposite its through hole 19 to ensure the grip of the material. sealant capable of falling through the vent 8; under the assembly of the membrane 9 to provide an optical reflection function of the radiation to be detected; at different trenches for the protection of the substrate 3 during the etching step during the formation of the trenches and to improve the grip of the encapsulation layer 6 on the substrate; and at the anchoring nails 11a to improve the grip of the nails on the substrate and to improve the electrical conduction between the nails and the read circuit disposed in the substrate. The thickness of this attachment layer is preferably constant over its entire extent, and especially at the different areas mentioned above.
    [0012] This adhesion layer may be made of chromium or titanium, aluminum, titanium nitride, optionally in the form of a stack of sub-layers made of these materials, or other suitable material, and have a thickness of order of 100nm to 400nm. According to an embodiment shown in FIGS. 3 and 4, the detectors 2 whose membrane 9 comprises a through-orifice 19 have a membrane architecture with intermediate electrical insulation, as described in the document EP1067372. FIG. 3 is a view from above of an absorbent membrane 9 of a bolometric detector according to this type of architecture. It is connected to four anchoring nails 11a and is suspended by means of two heat insulating arms 11b. Figure 4 is a sectional view along the plane A-A of Figure 3. The membrane 9 comprises a layer of a bolometric material 20 (thus resistive), for example doped amorphous silicon or vanadium oxide. It also comprises a layer of a dielectric material 21 deposited on the bolometric layer 20 and which covers the latter on two distinct zones 21a, 21b.
    [0013] It also comprises a layer of an electrically conductive material 22 deposited on the dielectric layer 21 and the bolometric layer 20 and etched locally over the entire width of the membrane to the dielectric layer so as to form three distinct conductive portions 22a. , 22b, 22c. The conductive layer 22 extends 3033045 12 on the isolation arm 11b to electrically connect the three portions 22a, 22b, 22c to the read circuit. Among the three conductive portions, two portions 22a, 22c located at the ends of the membrane 9 are electrically connected to two parts of the same isolation arm 11b and thus form two electrodes intended to be brought to the same electrical potential. These two end portions 22a, 22c surround a central portion 22b connected to another isolation arm which forms an electrode intended to be taken to another electrical potential. The dielectric layer 21 is etched so that each electrode 22a, 22b, 22c is in electrical contact with the bolometric material 20 and the end electrodes 22a, 22c are electrically isolated from the central electrode 22b. In this embodiment, the absorbent membrane 9 has a through hole 19, here of oblong profile, disposed in the center of the central electrode 22b. Preferably, the orifice 19 is disposed at the level where the dielectric layer 21 is etched. The orifice 19 thus passes only through the central electrode 22b and the bolometric layer 20. Preferably, the distance, measured in the width direction of the orifice 19, between the edge of the orifice and the edge of the dielectric layer 21, facing the orifice, is greater than or equal to the thickness of the bolometric layer 20 in contact with the central electrode 22b in this area. By this positioning of the orifice, any influence thereof on the electrical properties of the absorbent membrane is minimized or even eliminated.
    [0014] The example described with reference to FIGS. 3 and 4 shows a bolometric layer 20 in the lower part of the membrane 9, on which the dielectric layer 21 and the electrodes 22a, 22b, 22c rest. However, an inverted arrangement of the layers is also feasible, in which the electrodes 22a, 22b, 22c are situated in the lower part of the membrane 9, on which the dielectric layer 21 and then the bolometric layer 20 rest. According to one embodiment shown in Figure 5, the profile of the release vent 8, in a plane parallel to the plane of the substrate, has an oblong shape, that is to say elongated. Its small dimension X, measured in the direction of the width of the vent, is selected 3033045 13 so as to ensure effective sealing of the vent, and its large dimension Y, measured in the direction of the length of the vent can be adjusted to facilitate the transit of the reactive species and the reaction products of the etching of the sacrificial layer material being eliminated, which makes it possible to optimize the evacuation time of the sacrificial layers. As such, the width X may typically be between about 150 nm and 600 nm, while the large dimension Y may be of the order of a few microns, for example 5 μm. In addition, the oblong shape of the vent 8 has at least one longitudinal end, preferably both longitudinal ends, rounded. The longitudinal end is an end of the vent along the longitudinal axis thereof. For example, the rounded shape of one end may be a circular arc whose radius of curvature may be equal to half the average width X of the vent. More generally, it may correspond to a continuous curved shape, as in the example of FIG. 5, circular or elliptical, or to a succession of straight or substantially curved segments.
    [0015] The inventors have shown that this form of vent makes it possible to avoid the risks of formation of cracks starting from the encapsulation layer 6 and propagating in the sealing layer 7. It is indeed essential to avoid any risk of cracks likely to break the hermeticity of the cavity, especially when the same cavity houses a detector array because a local defect of hermeticity could lead to the functional loss of the complete device. In addition, the step of eliminating the sacrificial layers is optimized, especially in terms of the elimination time of the sacrificial layers, by a conjugated effect between the oblong shape of the vent and the central position thereof vis-à-vis -vis the detector. As shown in FIG. 6, the inventors have observed that the sealing layer 7, bordering the vents 8, has a tendency to extend vertically, that is to say in the direction of the thickness of the layer 7, with a non-zero angle with respect to the normal, that is to say with respect to an axis orthogonal to the plane of the substrate, in particular when a vacuum thin-film deposition technique is used, such as evaporation or low pressure spraying. The average width X of the vents can be chosen as a function of the thickness e of the deposited sealing layer 7, the thickness fraction B of the sealing layer effectively ensuring the hermeticity, and the angle of growth a, from the relation: X = 2.e. (1-B) .tan (a) By way of example, for a technique of deposition of the evaporation seal layer, the angle a is typically of the order of 15 ° to 20 °. For a thickness e of sealing layer 1800nm and if it is desired that 1200nm layer provides hermeticity (B = 2/3), we obtain an average width X of the vent of the order of 320nm to 410nm .
    [0016] Furthermore, as shown in FIG. 6, it is advantageous for the release vent 8 to have a cross-section, in a plane orthogonal to that of the substrate, which has a shape whose width increases as one s' away from the substrate 3. In other words, the vent 8 has a transverse profile flared towards the outside of the cavity. It is therefore narrower at its lower orifice opening on the cavity and wider at its upper orifice opening out of the cavity. By way of example, the width Xinf at the level of the lower orifice may be of the order of 100 nm to 350 nm while the width Xsup at the level of the upper orifice may be of the order of 250 nm to 800 nm. In this example, the encapsulation layer 6 has a thickness of the order of 800 nm. As a result of this shape of the cross-section of the vent 8, it improves the sealing quality of the vent. More precisely, for the same thickness e of sealing layer, the inventors have observed that the fraction B of layer that effectively ensures the seal is greater than the case where the vent has a straight cross section, which improves the quality of sealing. Such a cross-section of the vent may be obtained by generating a slope on the flanks of the resin before etching the vent either by post-development creep or by modifying the conditions of exposure and / or development of the vent. resin (exposure dose, focus, temperature and duration of post-exposure annealing) in a manner known to those skilled in the art. Such a cross-section of the vent may also be obtained during dry etching of the vent by adding an isotropic component to etching for example by adding oxygen in the chemistry used to etch the vent. In the case where the encapsulation layer 6 is made of silicon, the addition of fluorinated gases in the etch chemistry such as SF6 or CF4 will also contribute to increasing the isotropic component of the etching. The beneficial effect of this particular profile of the vent is particularly apparent when the angle 3 that the profile of the vent with the normal to the substrate is greater than the angle a defined above. By way of example, for an encapsulation layer thickness of 800 nm and for a width Xe of the lower orifice of 100 nm, the width Xsup of the upper orifice may be greater than 530 nm ((3 = 15 °). or even greater than 680 nm W = 200). According to an embodiment shown in FIGS. 7, 8 and 9, the detection device comprises a matrix of detectors arranged in the same cavity 4. The encapsulation structure 5 furthermore comprises at least one internal support portion 12 located between two adjacent detectors 2, and preferably a plurality of internal support portions.
    [0017] Some internal bearing portions may furthermore be arranged on the periphery of the detector matrix 2, bordering the cavity 4. The internal bearing portions 12 are formed by the thin encapsulation layer 6, which thus comprises the peripheral wall 6a, the upper wall 6b and the inner bearing portions 12. The inner bearing portions 12 rest, or bear, directly on the substrate 3. In other words, they are in direct contact with the substrate. These internal support portions 12 thus make it possible to reinforce the mechanical strength of the capsule 5. The adhesion of the capsule 5 to the substrate 3 is thus ensured on the one hand by a lower part of the peripheral wall 6a of the outer layer encapsulation 6 which rests on the substrate on the periphery of the cavity, and on the other hand by the internal support portion or portions 12 disposed in the cavity. This multiplicity of contact surfaces, distributed on the edge of the cavity and on the inside thereof, makes it possible to reinforce the mechanical strength of the capsule. By directly resting on, or resting directly on the substrate, it is meant that the internal bearing portions 12 are in direct contact with the substrate 3, either with the material constituting the substrate or with a thin layer deposited on the substrate. the surface of the substrate, for example a passivation layer or a tie layer, whether these thin layers extend continuously or not. The internal support portions therefore do not rest on the substrate via three-dimensional elements such as the holding elements of the suspended membranes. The inventors have indeed found that when support portions of the encapsulation layer rest, not on the substrate, but on the holding elements of the suspended membranes, more specifically on the anchoring nails, problems of adhesion of the capsule to the substrate occurs, which can lead to detachment or even destruction of the capsule. It seems indeed that the anchoring nails provide insufficient contact surface and flatness to ensure good adhesion of the support portions of the encapsulation layer. The detection device according to the invention thus reduces the risks of detachment of the capsule due to the mechanical stresses that sit in the thin layers of the capsule, whether intrinsic stresses of said thin layers or extrinsic stresses resulting from the differential thermal expansion of the capsule relative to the substrate. Thus, the encapsulation structure 5 defines a hermetic cavity 4 which houses the matrix of thermal detectors 2, this cavity 4 having a form of network of sub-cavities, or cells, communicating with each other, which each house a subset of 20 thermal detectors. The cells are separated from each other by the internal support portions. As previously explained, this network of cells is delimited by the same encapsulation layer 6 which extends so as to form the peripheral walls 6a and 6b of the cavity 4 and the inner support portions 12. the radiation detection device 1 comprises a hermetic cavity 4 which houses a plurality of thermal detectors 2, while having a cavity mechanical strength reinforced by the presence of the internal support portion or portions 12 which rest directly on the substrate 3. The fact of accommodating a plurality of thermal detectors 2 in the cavity allows the filling rate to be increased, for example by reducing the stamping pitch or by enlarging the absorbing membranes 9, or by pooling the 3033045 17 anchor nails 11a. Furthermore, parasitic electrical coupling between detectors 2 is avoided insofar as the internal bearing portions 12 are not in contact with the anchoring nails. This device also allows the elongation of the heat-insulating arms 11b to improve the thermal insulation of the absorbent membranes 9.
    [0018] FIG. 8 is a sectional view along the plane AA of the detection device 1 shown in FIG. 7. It shows in more detail the encapsulation layer 6 extending around and above the detector matrix 2 of FIG. in order to form the cavity 4. The peripheral wall 6a forms the edge of the cavity and the upper wall 6b extends above the detectors 2. The peripheral wall 6a has a lower peripheral portion 6c 10 which bears or rests , directly on the substrate, so as to ensure the adhesion of the capsule on the substrate. FIG. 9 is a sectional view along the plane BB of the detection device 1 shown in FIG. 7. In this figure, the internal bearing portions 12 each have a peripheral lateral wall 12a and a lower portion 12b, and bear directly on the substrate 3 at the bottom wall 12b. In other words, each inner support portion 12 is in direct contact with the substrate 3, either with the constituent material of the substrate 3 or, as mentioned above, with a thin layer deposited on the surface of the substrate. As shown in FIG. 7, the internal bearing portions 12 may have a profile, in the plane of the substrate, of oblong, that is to say elongated, shape. They can be arranged each between two adjacent suspended membranes and two neighboring anchoring nails, so as to optimize the filling rate. The ends of the oblong profile of the internal support portions 12 may be rounded, so as to enhance the adhesion thereof to the substrate 3 by a better distribution of mechanical stresses. The width of the internal support portions may be less than 1.5 μm, for example between 0.5 μm and 0.8 μm, and the length may be adjusted according to the space available between the sensors and in particular the nails. anchor.
    [0019] In the example of FIG. 7, the heat-insulating arms 11b extend mainly along a first axis, and the internal bearing portions 12 of the capsule 5 extend along a second axis orthogonal to the first axis. between two adjacent membranes 9 and two neighboring anchoring nails 11a. The width and length of the internal support portions can be optimized by benefiting from the area left free in this area by the absence of heat insulating arm. The surface of the internal bearing portions in contact with the substrate can thus be large, which improves the adhesion and the mechanical strength of the capsule. An example embodiment method is now detailed, with reference to FIGS. 10 to 12 which are views, in section along the CC axis, of the detection device shown in FIG. 7. The detection device 1 comprises a substrate 3 in which a circuit for reading and controlling the thermal detectors 2 is provided. The substrate 3 may comprise a passivation layer 13, for example made of silicon oxide SiO or silicon nitride SiN.
    [0020] According to an embodiment detailed below, the substrate 3 may also comprise a tie layer 14, continuous or not, deposited on the passivation layer 13. The attachment layer 14 may be made of titanium or chromium , and have a thickness for example between about 100nm and 300nm. In a manner known per se, a first sacrificial layer 15 is deposited and the anchoring nails 11a, the heat-insulating arms 11b and the absorbent membranes 9 are produced in and on this sacrificial layer 15. The sacrificial layer can be produced polyimide or even a mineral material such as silicon oxide, polysilicon or amorphous silicon. Photolithography and etching steps are performed to form through-holes 19 in the absorbent membranes 9. As illustrated in FIG. 11, a second sacrificial layer 16 is then deposited on the first sacrificial layer 15, the anchoring elements 11a and thermal insulation 11b and the absorbent membranes 9. It is preferably made of the same material 3033045 19 as that of the first sacrificial layer 15 and has a thickness for example between 0.5um and 5um. Photolithography and etching steps, for example RIE etching, are performed so as to form, preferably during a sequence of common steps, trenches 17, 18 through the entire thickness of the sacrificial layers. , that is to say up to the substrate 3, more precisely here up to the tie layer 14. A first trench 17 is made to extend continuously around the detector matrix 2 and is intended for the subsequent production of the peripheral wall of the encapsulation structure, and at least one second trench 18, preferably several, is made between two adjacent detectors 2 for the purpose of subsequently forming the bearing portion internal. The first and second trenches 17, 18 have a substantially identical depth, so that the peripheral wall of the encapsulation structure and the side walls of the support portions have in fine a substantially identical height. The method is thus simplified, especially as regards the control of the engraving depth. In the case where the sacrificial layers 15, 16 are made of polyimide, the process for producing the trenches may involve the deposition of a mineral protection layer (not shown), for example of SiN or SiO, or of amorphous silicon, on the surface of the second sacrificial layer 16. A photolithography step then makes it possible to define openings in a resin layer where the trenches are to be etched. The etching of the trenches is then carried out in two steps, a first step during which the protective layer is etched, for example by RIE etching, to the right of the openings of the resin, a second step during which the first and the second second sacrificial layer are etched, for example by RIE etching, to the substrate at the openings obtained in the protective layer at the first etching step. At this point, the protective layer can be removed. This sequence of steps is justified by constraints of chemical compatibility of the layers in the presence and by geometrical constraints (form factor of the trenches). Indeed, the resin layer disappears during the second step of etching the polyimide since these layers are all organic in nature, therefore similarly sensitive to the etch chemistry implemented in the second step. The opening of the protective layer is then used as a relay to continue to limit the etching to the areas where it is desired to make the trenches. The method of the second etching step is further adapted to ensure a high etching anisotropy, which allows for high form factors and vertical etching flanks without the presence of overhang. It is further adapted to guarantee high selectivity on the one hand with respect to the protective layer (in SiN or SiO) and on the other hand with respect to the surface of the substrate, generally covered with an insulating passivation layer of SiO or SiN. This high selectivity is advantageous because it makes it possible to reduce the thickness of the protective layer (typically at 30 nm), which is likely to facilitate its subsequent removal. The trenches 17, 18, in particular the second trenches 18 intended for producing the internal bearing portions, have a high aspect ratio. By way of example, trenches of width less than or equal to 1.5 μm, for example between 0.5 μm and 0.8 μm, may be produced in a layer of polyimide of thickness between 2 μm and 6 μm, for example 4 μm. .m. The length of the second trenches 18 can be adapted according to the constraints of compact integration and robustness of the capsule, and can be of the order of a few microns to a few millimeters. These dimensions of the trenches 20 make it possible to produce a matrix of thermal detectors with a particularly low stamping pitch, for example 17 μm or even 12 μm. The tie layer 14 is preferably made of a material with respect to which the etching of the trenches is selective, so as to avoid any etching of the substrate. The material may be titanium, chromium and the tie layer may have a thickness of the order of 100 nm to 300 nm. As shown in FIG. 12, a thin encapsulation layer 6, transparent to the radiation to be detected, is then deposited according to a conformal deposition technique adapted to obtain a good overlap of the vertical sides of the trenches 17, 18, with a layer thickness. substantially constant. It may be for example a layer 3033045 21 amorphous silicon developed by CVD or iPVD, a thickness typically between about 200nm and 2000nm when measured on a flat surface. The deposition of the encapsulation layer 6 on a surface structured by trenches of which at least one continuous peripheral trench 17 (closed perimeter) leads to the formation of the capsule 5, made with the material of the encapsulation layer and forming , in contact with the substrate 3, a cavity 4 in which is housed the matrix of detectors. The covering of the sides of the internal trenches 18 by the encapsulation layer 6 makes it possible to reproduce the shape of the internal trenches so as to form internal bearing portions 12, preferably of oblong shape with rounded ends. Note that these inner support portions 12 may be solid or hollow (consisting of two spaced walls) depending on whether the width of the inner trenches 18 is respectively small or large in front of the thickness of the encapsulation layer 6. Through holes , forming release vents 8 intended to allow the evacuation of the sacrificial layers 15, 16 out of the cavity 4, are then made by photolithography and etching in the encapsulation layer 6, and positioned at the right of the through orifices 19 of the membranes 9. Each vent 8 has a profile, in a plane parallel to the plane of the substrate, of oblong shape with rounded ends. Preferably, the profile of each vent, in a plane orthogonal to that of the substrate, has a flared shape, which widens as one moves away from the substrate.
    [0021] The sacrificial layers 15, 16 are then removed by chemical etching, preferably in the gas phase or in the vapor phase, depending on the nature of the sacrificial layers (gaseous phase in the case of the polyimide described here), so as to form the cavity 4 housing the matrix. detectors 2, and internal support portions 12. Due to the oblong shape of the vent, this step is optimized in terms of duration.
    [0022] A sealing layer (not shown in FIG. 2) is then deposited on the encapsulation layer 6 with a thickness sufficient to seal or plug the release vents 8. The quality of the hermeticity is enhanced by the rounded ends of the oblong shape of the vents 8, as well as the flared shape of the vents.
    [0023] The sealing layer is transparent to the electromagnetic radiation to be detected and may have an antireflection function to optimize the transmission of radiation through the encapsulation structure. As such, it may be formed of sublayers of germanium and zinc sulfide in the case of a radiation to be detected in the range of wavelengths ranging from 8um to 12um, for example a first underlayer germanium of about 1.7um and then a second sublayer of zinc sulphide of about 1.2um. The sealing layer is preferably deposited by a vacuum thin-film deposition technique, such as vacuum evaporation of an electron beam heated source (EBPVD) or as cathode sputtering or ion beam sputtering.
    [0024] Thus, a vacuum cavity 4 or vacuum is obtained in which is housed the matrix of thermal detectors 2. According to an embodiment shown in Figures 7, 13 and 14, the encapsulation layer 6 is deposited on the periphery of the detector array 2 so that the section of the layer has, in a plane parallel to the plane of the substrate, a shape with rounded corners. Thus, the peripheral wall 6a of the encapsulation layer 6 is formed, at each corner, with two portions 6a-1, 6a-2 extending substantially rectilinear, each along an orthogonal axis X1, X2. one to another. The rectilinear portions 6a-1 and 6a2 do not meet at a right angle but are connected to each other by a rounded portion 6a-3. By rounded portion is meant a portion having at least one curved segment, for example circular or elliptical, or at least one straight segment, and preferably several straight segments, extending along a non-collinear axis to the respective axis of the portions. rectilinear.
    [0025] FIG. 13 shows an example of a rounded portion 6a-3 in the form of an arcuate segment connecting the rectilinear portions 6a-1 and 6a-2. The radius of this arc of a circle, measured from the outer surface of the rounded portion 6a-3, that is to say oriented towards the outside of the cavity (excluded circle), may be greater than or equal to two times the width L 3033045 23 of the peripheral wall. Preferably, the dimension of the rounded portion is such that the radius of an inscribed circle, that is to say tangent to the inner surface, facing the cavity, of the rounded portion is greater than or equal to twice the width L. The width L is defined as the average width of a substantially straight portion 5 6a-1, 6a-2 of the peripheral wall 6a. The rounded portion 6a-3 preferably has a width substantially equal to that of the rectilinear portions. FIG. 14 shows another example of the rounded portion, as a variant of that of FIG. 13. In this example, the rounded portion 6a-3 is formed by the succession of two straight segments inclined with respect to each other. the other. It is possible to define an exisiting circle, tangent to the outer surface of each segment. The orientation of the segments may be such that the radius of the ex-marked circle is greater than or equal to twice the width L of the peripheral wall. Preferably, the orientation of the segments is such that the radius of an inscribed circle, that is to say tangent to the inner surface of the segments, is greater than or equal to twice the width L.
    [0026] By way of example, the width L of the peripheral wall of the encapsulation layer may be between about 200 nm and about 2 μm. The radius of the circle exinscribed or inscribed is greater than or equal to a value between 400 nm and 4 μm as a function of the width L, for example 2 μm in the case of a width L equal to 800 nm. The inventors have observed that the production of rounded portions at the corners of the capsule improves the adhesion thereof to the substrate. It has indeed been observed that the adhesion of the capsule is not homogeneous along the peripheral wall and that the corners of the capsule have a reinforced adhesion when rounded portions are made. Thus, when the capsule has rounded corners and internal bearing portions, overall adhesion of the capsule to the reinforced substrate is achieved by a conjugate effect between the multiplicity of the bearing surfaces and the localized reinforcement of the capsule. adhesion to the corners of the cavity.
    [0027] Of course, the encapsulation structure with rounded corners, described here in the case where the same cavity houses a matrix of detectors, can be used in the case where several hermetic cavities are made, each housing a single detector. 5
    权利要求:
    Claims (15)
    [0001]
    REVENDICATIONS1. Device for detecting (1) electromagnetic radiation, comprising: a substrate (3), at least one thermal detector (2), arranged on the substrate (3), comprising a membrane (9) adapted to absorb the radiation to be detected, suspended above the substrate (3) and thermally insulated therefrom by holding and thermal insulating elements (11), an encapsulation structure (5) of said at least one thermal detector (2), comprising a layer encapsulation means (6) extending around and above said at least one thermal detector (2) so as to define with the substrate (3) a cavity (4) in which said at least one thermal detector (2) is characterized in that the encapsulation layer (6) comprises at least one through orifice (8), said release vent, each release vent (8) being arranged such that at least one thermal detector (2) has a single release vent (8) located opposite the abso membrane rbante (9) corresponding, preferably to the right of the center of said absorbent membrane (9).
    [0002]
    2. Detection device according to claim 1, wherein a plurality of thermal detectors (2) is disposed in said cavity (4), the encapsulation layer (6) comprising a plurality of release vents (8) disposed of so that at least a portion of said thermal detectors (2) each have a single release vent (8) located opposite the corresponding absorbent membrane (9), or in which a single thermal detector (2) is disposed in said cavity (4), the encapsulation layer (6) then comprising a single release vent (8) located opposite the absorbent membrane (9) of the thermal detector (2).
    [0003]
    3. Detection device according to claim 1 or 2, wherein each absorbent membrane (9) has a through hole (19), located in line with the corresponding release vent (8), of dimensions equal to or greater than those of said the vent (8). 3033045 26
    [0004]
    4. Detection device according to claim 3, wherein the absorbent membrane (9) comprises a stack of a bolometric layer (20), a dielectric layer (21) structured so as to form two distinct portions (21a, 21b ), and an electrically conductive layer (22) structured so as to form three electrodes (22a, 22b, 22c), of which two electrodes (22a, 22c) intended to be carried at the same electrical potential frame the third electrode ( 22b) said central being intended to be brought to a different electrical potential, each electrode being in contact with the bolometric layer (20), the central electrode (22b) being electrically isolated from the other electrodes (22a, 22c) by the dielectric layer ( 21), the orifice passing through the central electrode (22b) and the bolometric layer (20) in an area located in the portions (21a, 21b) of the dielectric layer (21).
    [0005]
    5. Detection device according to claim 3 or 4, wherein the encapsulation structure (5) further comprises a sealing layer (7) covering the encapsulation layer (6) so as to make the cavity (4) hermetic, and wherein the substrate 15 (3) comprises a tie layer (14) disposed facing the through hole (19) of the membrane (9) corresponding, and adapted to ensure the adhesion of the material of the sealing layer (7).
    [0006]
    6. Detection device according to claim 5, wherein the attachment layer (14) extends under the assembly of the membrane (9) corresponding and is made of a material adapted to 20 further reflect the radiation electromagnetic to detect.
    [0007]
    7. Detection device according to any one of claims 1 to 6, wherein the release vent (8) has a transverse profile, in a plane orthogonal to the plane of the substrate, the width increases as the distance to the substrate increases.
    [0008]
    8. Detection device according to claim 7, wherein the encapsulation structure (5) further comprises a sealing layer (7) covering the encapsulation layer (6) so as to make the cavity (4) hermetic, the sealing layer (7) having a border extending in the direction of the thickness of the sealing layer (7) from the edge of the release vent (8) with an angle α zero relative to an axis orthogonal to the plane of the substrate, and wherein the transverse profile of the release vent (8) forms an angle (3 with respect to the same orthogonal axis greater than the angle a.
    [0009]
    The sensing device according to claim 7 or 8, wherein the longitudinal end of the release vent (8) has a circular arc shape, or is formed of a succession of substantially rectilinear segments inclined at one end. compared to others.
    [0010]
    10. Detection device according to any one of claims 1 to 9, comprising a matrix of thermal detectors (2), wherein the encapsulation layer (6) comprises at least a portion (12), said support portion internal, located between two detectors (2) adjacent, which bears directly on the substrate.
    [0011]
    11. Detection device according to claim 10, wherein the inner bearing portion (12) has a profile, in a plane parallel to the plane of the substrate (3), of oblong shape, preferably at the ends rounded longitudinal.
    [0012]
    The sensing device according to claim 10 or 11, wherein the inner bearing portion (12) has a side wall (12a) and a lower portion (12b), said side wall (12a) extending in a plane substantially orthogonal to the plane of the substrate over the entire height of the cavity (4), and the lower part (12b) being in contact with the substrate (3).
    [0013]
    13. Detection device according to any one of claims 10 to 12, wherein at least one inner support portion (12) is disposed between two adjacent absorbent membranes (9) and two adjacent holding nails (11a), each of said holding nails participating in maintaining said adjacent membranes, and wherein the inner bearing portion (12) is oriented longitudinally along said membranes (9). 25
    [0014]
    The sensing device according to any one of claims 1 to 13, wherein the encapsulation layer (6) comprising a peripheral wall (6a) which surrounds the detector array, and which has a section, in a plane parallel to the plane of the substrate, of square or rectangular shape, whose corners are rounded.
    [0015]
    15. Detection device according to any one of claims 10 to 14 according to claim 6, the holding and thermal insulation elements (11) comprising holding nails (11a), in which the grip layer (14) further comprises portions on which the holding nails (11a) rest, and / or portions on which rest internal support portions (12) of the encapsulation layer (6), and is made in a material capable of ensuring the adhesion of the holding nails and / or support portions. 10
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    优先权:
    申请号 | 申请日 | 专利标题
    FR1551489A|FR3033045B1|2015-02-20|2015-02-20|ELECTROMAGNETIC RADIATION DETECTION DEVICE WITH HERMETIC ENCAPSULATION STRUCTURE WITH RELEASE VENT|
    FR1551489|2015-02-20|FR1551489A| FR3033045B1|2015-02-20|2015-02-20|ELECTROMAGNETIC RADIATION DETECTION DEVICE WITH HERMETIC ENCAPSULATION STRUCTURE WITH RELEASE VENT|
    CA2920628A| CA2920628A1|2015-02-20|2016-02-10|Electromagnetic radiation detection device with an airtight encapsulation structure including a release vent|
    EP16156190.7A| EP3067675A3|2015-02-20|2016-02-17|Device for detecting electromagnetic radiation with sealed encapsulation structure having a release vent|
    US15/048,058| US9851254B2|2015-02-20|2016-02-19|Device for detecting electromagnetic radiation possessing a hermetic encapsulating structure comprising an exhaust vent|
    JP2016029627A| JP6758052B2|2015-02-20|2016-02-19|Electromagnetic radiation detection device with an enclosed structure with an outlet|
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